highly significantP < 0.05
Histomorphometric analysis: In general, the Os% in the g-C 3 N 4 and GO implanted defects displayed a highly significant difference ( P < 0.05) compared with the control defect throughout the experiment (Fig. 6 A).
Histomorphometric analysis: In general, the Os% in the g-C 3 N 4 and GO implanted defects displayed a highly significant difference ( P < 0.05) compared with the control defect throughout the experiment (Fig. 6 A).