New Chemically Amplified Positive Photoresist with Phenolic Resin Modified by GMA and BOC Protection.

Polymers (Basel) · 2023 · PMC10097361 · PMID 37050212

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a decreasing trendno p-value reported

As shown in Table 2 , the variation in film thickness of phenolic resin grafted with different proportions of GMA shows that the film thickness of the synthesized resin changed with increasing proportion of GMA, and its film thickness loss value basically showed a decreasing trend.

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