Monolayer Capping Provides Close to Optimal Resistance to Laser Dewetting of Au Films.

ACS Appl Electron Mater · 2023 · PMC10448724 · PMID 37637971

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closest p

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hardly significantno p-value reported

Supposing first small energy and small dewet areas so that the elastic regime is not reached in case C, we have 13 For the materials parameters in Table 3 , this comes to 0.54, representing an almost factor-of-two improvement over case B, which is hardly significant.

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