Effect of Fluoride Layer Growth on the Deposition Rate under Different Microchannel Structures.

ACS Omega · 2023 · PMC10702204 · PMID 38075790

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highly significantno p-value reported

The growth of the fluoride layer is difficult to eliminate in the current PECVD process, and it is highly significant to effectively counteract the impact of the fluoride layer growth by modifying the microchannel structure.

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