The preparation of polysilicon films on highly boron doped silicon substrates and their effects on Cu out-diffusion.

RSC Adv · 2024 · PMC10851680 · PMID 38332799

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closest p

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an increasing trendno p-value reported

As well, the surface Cu of the uncontaminated samples remained low after 120 h of placement and did not show an increasing trend.

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