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Research on Evolution of Relevant Defects in Heavily Mg-Doped GaN by H Ion Implantation Followed by Thermal Annealing.

Materials (Basel) · 2024 · PMC11173091 · PMID 38893782

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a notable trendno p-value reported
The SIMS result for Sample H reveals a notable trend that the H concentration exhibits higher levels within the depth range of 50~150 nm compared to a depth of 400~450 nm.

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