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Thin Layers of Cerium Oxynitride Deposited via RF Sputtering.

Materials (Basel) · 2024 · PMC11242422 · PMID 38998225

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an increasing trendno p-value reported
Depending on the nitrogen flow used for the deposition of ZrCeO x N y films, the cerium percentage deposited exhibits an increasing trend with the nitrogen flow (except for φN 2 = 35.0 sccm, where it decreases to 67% of Ce).

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