Water Vapor-Impermeable AlON/HfO<i><sub>x</sub></i> Bilayer Films Deposited by Hybrid High-Power Impulse Magnetron Sputtering/Radio-Frequency Magnetron Sputtering Processes.

Materials (Basel) · 2024 · PMC11595907 · PMID 39597277

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a decreasing trendno p-value reported

The WVTR analyzed using the water vapor permeation analyzer exhibited a decreasing trend from 0.3040 to 0.1802, 0.1088, and 0.0972 g m −2 day −1 when the duty cycle for fabricating AlON films increased from 5% to 10%, 15%, and 20%.

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