Comparative study on the influence mechanism of He/Ar/N<sub>2</sub> plasma treatments on the high tensile stress of a multilayer silicon nitride film.

RSC Adv · 2025 · PMC12120931 · PMID 40453121

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The sentences

a decreasing trendno p-value reported

However, unlike multilayer films treated with Ar or N 2 plasma, the stress in multilayer films treated with He plasma exhibits a decreasing trend as the number of layers increases.

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Quoted from the open-access full text in Europe PMC under the licence the publisher applied. The sentence is reproduced exactly as published; the emphasis is ours.

Comparative study on the influence mechanism of He/Ar/N&lt;sub&gt;2&lt;/sub&gt; plasma treatments on the high tensile stress of a multilayer silicon nitride film.

The sentences

Comparative study on the influence mechanism of He/Ar/N<sub>2</sub> plasma treatments on the high tensile stress of a multilayer silicon nitride film.