Barely Significant
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Deposition of Mesoporous Silicon Dioxide Films Using Microwave PECVD.

Materials (Basel) · 2025 · PMC12251488 · PMID 40649693

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hedged sentence
0.0010
closest p · 0.0× alpha
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boldest claim

The sentences

highly significantp -values < 0.001actually significant
Six of the seven main effects were highly significant with p -values < 0.001.

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