Comprehensive study of ultrathin TiN films by ALD: influence of film thickness and substrate on composition, structure, sheet resistance and durability.

Nanoscale Adv · 2026 · PMC13055914 · PMID 41952669

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closest p

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a decreasing trendno p-value reported

At the very onset, an O concentration of ∼18% was recorded, which had a decreasing trend during the sputtering period.

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