Effect of Heating/Cooling Rate and Temperature on Microstructure and Electrical Properties of Sputter-Deposited PZT Thin Films Crystallized by Conventional Furnace Annealing.

In contrast, the 1 °C·min −1 curve exhibits a decreasing trend with increasing temperature, while the 7 °C·min −1 curve displays comparatively low values across all temperatures that increase slightly with temperature.

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The calculated microstrain presented in Figure 12 c remains relatively independent of the temperature, apart from the 7 °C·min −1 curve, which shows a slightly increasing trend with rising temperature.

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Consequently, P r exhibits a decreasing trend with increasing heating/cooling rate at an annealing temperature of 550 °C and an increasing trend at 700 °C ( Figure 16 b).

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