Effect of thermal treatment on the growth, structure and luminescence of nitride-passivated silicon nanoclusters.

Nanoscale Res Lett · 2011 · PMC3211220 · PMID 21711680

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an increasing trendno p-value reported

The intensity of the annealed films was also an interesting fact in that the total power density showed an increasing trend with longer annealing times over the time period studied for the lower temperature anneals.

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