Rapid Processing of Wafer-Scale Anti-Reflecting 3D Hierarchical Structures on Silicon and Its Templation.

Materials (Basel) · 2018 · PMC6316734 · PMID 30567408

Europe PMC DOI

hedged sentence

—

closest p

—

boldest claim

The sentences

an increasing trendno p-value reported

Further, as the etching time increased from 5 s to 10 s, and 20 s, an increasing trend in the reflectance was observed.

also in 63,971 other papers

Quoted from the open-access full text in Europe PMC under the licence the publisher applied. The sentence is reproduced exactly as published; the emphasis is ours.