Effect of Bias Voltage on Mechanical Properties of HiPIMS/RFMS Cosputtered Zr-Si-N Films.

Materials (Basel) · 2019 · PMC6747595 · PMID 31438512

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a decreasing trendno p-value reported

[ 35 ] reported that the hardness of ZrN coatings increased with an increase in residual stress up to 4.24 GPa in compression, and that further increasing the compressive stress to more than 7.95 GPa resulted in a decreasing trend in hardness, which was attributed to the inverse Hall–Petch effect.

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an increasing trendno p-value reported

[ 42 ] reported that the hardness and H 3 /E 2 ratio exhibited an increasing trend for the DCMS- and RFMS-cosputtered Zr–Si–N films, and a maximum H 3 /E 2 value of 0.40 GPa was accompanied with a hardness of 20.6 GPa.

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