Radio Frequency Plasma-Enhanced Reactive Magnetron Sputtering Deposition of α-SiN <sub><i>x</i></sub> on Photonic Crystal-Laser Diodes for Facet Passivation.

ACS Omega · 2019 · PMC6893945 · PMID 31815221

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closest p

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an increasing trendno p-value reported

With the increase of the Ar flow rate, α generally followed an increasing trend from 0.75 to 3.25 eV.

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