The film density was proportional to the critical angle θc in the reflectance curve, and θc showed a decreasing trend as the O 2 flow ratios increased, confirming the decreased trend of film density displayed in Figure 3 h.
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Stoichiometry Dependence of Physical and Electrochemical Properties of the SnO<sub>x</sub> Film Anodes Deposited by Pulse DC Magnetron Sputtering.
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