Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO₂.

Other effects are expected to be of less influence, such as the potential influence of photons (e.g., UV-induced surface hydroxylation 44 ), a thermal growth component during the plasma half-cycle, 28 and soft-saturation during the precursor step, where decomposition of Ti(NMe 2 ) 4 may be significant at high temperatures (e.g., at 300 °C). 45 By the aforementioned results it is concluded that, also under mild plasma conditions, ions have a strong impact on the film crystallinity and GPC during plasma ALD of TiO 2 .

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