Methods for latent image simulations in photolithography with a polychromatic light attenuation equation for fabricating VIAs in 2.5D and 3D advanced packaging architectures.

Microsyst Nanoeng · 2021 · PMC8433293 · PMID 34567753

Europe PMC DOI

hedged sentence

—

closest p

—

boldest claim

The sentences

highly significantno p-value reported

3 – 4 that diffraction effects are highly significant across the entire photomask diffractor, even when the incident wavelengths and diffractor sizes differ by more than two orders of magnitude.

also in 132,142 other papers

Quoted from the open-access full text in Europe PMC under the licence the publisher applied. The sentence is reproduced exactly as published; the emphasis is ours.