Reaction control of metal-assisted chemical etching for silicon-based zone plate nanostructures.

RSC Adv · 2018 · PMC9079411 · PMID 35541233

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a slightly increasing trendno p-value reported

With increasing concentration of H 2 O 2 from 0.17 M to 1.4 M (C1–C4) the cell potential shows a slightly increasing trend.

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Quoted from the open-access full text in Europe PMC under the licence the publisher applied. The sentence is reproduced exactly as published; the emphasis is ours.