Studies of Bis-(Sodium-Sulfopropyl)-Disulfide and 3-Mercapto-1-Propanesulfonate on/into the Copper Electrodeposited Layer by Time-of-Flight Secondary-Ion Mass Spectrometry.

This observation is supported by the chloride/thiol intensity ratio that demonstrates the same behaviour as the CH 2 SO 3 − /C 3 H 5 SO 3 − ratio, which exhibits a decreasing trend as SPS concentration increases.

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