Introduction of Nanoscale Si3N4 to Improve the Dielectric Thermal Stability of a Si3N4/P(VDF-HFP) Composite Film.

Polymers (Basel) · 2023 · PMC10648552 · PMID 37959943

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showed a trendno p-value reported

As the temperature increased, the ε r curves of all samples showed a trend almost parallel to the abscissa, indicating that the Si 3 N 4 /P(VDF-HFP) composite material samples had good temperature stability.

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Introduction of Nanoscale Si<sub>3</sub>N<sub>4</sub> to Improve the Dielectric Thermal Stability of a Si<sub>3</sub>N<sub>4</sub>/P(VDF-HFP) Composite Film.

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