A clear trend between residual stress and chemical resistance was confirmed in an acid resistance test by using 40% HF [ 75 ] with no appreciable etching after the test for the lowest tensile stress (+41 MPa).
← all excerpts
Amorphous SiC Thin Films Deposited by Plasma-Enhanced Chemical Vapor Deposition for Passivation in Biomedical Devices.
1
—
—