Evolution of Chemical, Structural, and Mechanical Properties of Titanium Nitride Films with Different Thicknesses Fabricated Using Pulsed DC Magnetron Sputtering.

Materials (Basel) · 2024 · PMC11678592 · PMID 39769666

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showed a trendno p-value reported

From the top to the bottom of the TiN film, Ti-N-O and Ti-O showed a trend of first decreasing and then increasing, and Ti-N-O changed faster than Ti-O.

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