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Wafer-Scale Demonstration of BEOL-Compatible Ambipolar MoS<sub>2</sub> Devices Enabled by Plasma-Enhanced Atomic Layer Deposition.

ACS Appl Mater Interfaces · 2025 · PMC12447386 · PMID 40910572

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a clear trendno p-value reported
A clear trend of decreasing sheet resistance with increasing ALD cycles and lower synthesis temperatures was observed.

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