Directed Self-Assembly of an Acid-Responsive Block Copolymer for Hole-Shrink Process and Pattern Transfer.

Nanomaterials (Basel) · 2025 · PMC12566743 · PMID 41149540

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a clear trendno p-value reported

A clear trend was observed: as the bottom surface affinity shifted from PS- to PMMA-preferential, the residual PS layer thickness increased significantly.

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