ALD-grown semimetallic TiS x for hole injection into monolayer WSe2.

RSC Adv · 2025 · PMC12628730 · PMID 41268485

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closest p

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a clear trendno p-value reported

S5) do not yield a clear trend, making it unsuitable for extracting the contact resistance for both cases.

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Quoted from the open-access full text in Europe PMC under the licence the publisher applied. The sentence is reproduced exactly as published; the emphasis is ours.

ALD-grown semimetallic TiS &lt;sub&gt;&lt;i&gt;x&lt;/i&gt;&lt;/sub&gt; for hole injection into monolayer WSe&lt;sub&gt;2&lt;/sub&gt;.

The sentences

ALD-grown semimetallic TiS <sub><i>x</i></sub> for hole injection into monolayer WSe<sub>2</sub>.