Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies.

ACS Appl Mater Interfaces · 2018 · PMC5909180 · PMID 29554799

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showed a trendno p-value reported

The GPC again showed a trend of increasing with ⟨ V bias ⟩, but at a slower rate than the 10 s bias condition reaching a comparatively lower value at −254 V ( Figure 3 a).

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