Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant.

J Phys Chem C Nanomater Interfaces · 2018 · PMC6174421 · PMID 30319724

Europe PMC DOI

hedged sentence

—

closest p

—

boldest claim

The sentences

a clear trendno p-value reported

65 , 66 Interestingly, the C and N contents of the films are relatively constant and do not show a clear trend as a function of H 2 /(H 2 + N 2 ) ratio.

also in 19,460 other papers

Quoted from the open-access full text in Europe PMC under the licence the publisher applied. The sentence is reproduced exactly as published; the emphasis is ours.

Atomic Layer Deposition of Cobalt Using H<sub>2</sub>-, N<sub>2</sub>-, and NH<sub>3</sub>-Based Plasmas: On the Role of the Co-reactant.

The sentences