Stability Evaluation of Candidate Precursors for Chemical Vapor Deposition of Hafnium Diboride (HfB₂).

This indicates that these [Hf(BH 4 ) 2 L 2 ] molecules are more stable than the original [Hf(BH 4 ) 4 ] precursor and thus do not improve the potential decomposition route. There also does not seem to be a significant trend between O- or N-based ligands since they all contain similar levels of complexity (−OH vs −NH 2 ) with comparable E D values.

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