Influence of water contamination on the sputtering of silicon with low-energy argon ions investigated by molecular dynamics simulations.

Beilstein J Nanotechnol · 2022 · PMC9520830 · PMID 36225852

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closest p

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a clear trendno p-value reported

We observe a clear trend with a progressive reduction in the Si–O and Si–H counts for intermediate angles.

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